Attenuated phase-shifting mask and its encoding method

Chongxi Zhou; Feng Boru; Desheng Hou; Jin Zhang

doi:10.1117/12.347714

7 May 1999 Attenuated phase-shifting mask and its encoding method

Chongxi Zhou, Feng Boru, Desheng Hou, Jin Zhang

Proceedings Volume 3740, Optical Engineering for Sensing and Nanotechnology (ICOSN '99); (1999) https://doi.org/10.1117/12.347714
Event: Optical Engineering for Sensing and Nanotechnology (ICOSN '99), 1999, Yokohama, Japan

Abstract

Attenuated phase shifting mask and that with optical proximity correction is adopted to improve resolution of photolithography based on some calculation results. The first factor k1 of the photolithography could be to 0.50, and the optimal transmission is about to 8 to approximately 10%. And a new kind of method of making attenuated phase shifting mask by encoding is put forward, and the theoretical calculation results are accordant to the conventional attenuated shifting mask.

Citation Download Citation

Chongxi Zhou, Feng Boru, Desheng Hou, and Jin Zhang "Attenuated phase-shifting mask and its encoding method", Proc. SPIE 3740, Optical Engineering for Sensing and Nanotechnology (ICOSN '99), (7 May 1999); https://doi.org/10.1117/12.347714

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