Paper
7 May 1999 Continuous-phase diffractive optical element to realize uniform target illumination in inertial confinement fusion (ICF)
Qiaofeng Tan, Yingbai Yan, Guofan Jin, Minxian Wu
Author Affiliations +
Proceedings Volume 3740, Optical Engineering for Sensing and Nanotechnology (ICOSN '99); (1999) https://doi.org/10.1117/12.347708
Event: Optical Engineering for Sensing and Nanotechnology (ICOSN '99), 1999, Yokohama, Japan
Abstract
Rigorous requirements of target illumination are requested in Inertial Confinement Fusion (ICF) experiments, such as flat top, steep edge, low sidelobes and high light efficiency. Using Diffractive Optical Elements (DOEs) to realize such uniform illumination has many advantages, such as high light efficiency of pure phase modulation, strong flexibility of phase design and so on. A kind of hybrid algorithm based on hill-climbing and simulated annealing is utilized for phase design because of the ability of strong convergence of the hill-climbing and the global optimization potential of the simulated annealing. Continuous phase should be adopted to increase the light efficiency and decrease wide-angle scattering. The continuous phase DOEs with diameter 100 mm has been obtained by gray-level mask and ion-etching on the K9- glass substrate. The DOEs' interferogram and local profiles are given to detect the precision of manufacturing. The intensity distribution of the focal spot are measured by a general CCD, and a series of attenuators are used to increase the dynamic range of the CCD. The results after data- processing show that the uniform illumination has been obtained.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Qiaofeng Tan, Yingbai Yan, Guofan Jin, and Minxian Wu "Continuous-phase diffractive optical element to realize uniform target illumination in inertial confinement fusion (ICF)", Proc. SPIE 3740, Optical Engineering for Sensing and Nanotechnology (ICOSN '99), (7 May 1999); https://doi.org/10.1117/12.347708
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KEYWORDS
Phase shift keying

Algorithms

Charge-coupled devices

Diffractive optical elements

Optimization (mathematics)

Manufacturing

Attenuators

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