Improvement of OPC data processing for photomask fabrication

Nobuhito Toyama; Hiroyuki Miyashita; Kouji Ishida

doi:10.1117/12.360196

25 August 1999 Improvement of OPC data processing for photomask fabrication

Nobuhito Toyama, Hiroyuki Miyashita, Kouji Ishida

Proceedings Volume 3748, Photomask and X-Ray Mask Technology VI; (1999) https://doi.org/10.1117/12.360196
Event: Photomask and X-Ray Mask Technology VI, 1999, Yokohama, Japan

Abstract

For common approach for low k₁-factor process, or just shrink LSI chip size, Optical Proximity effect Correction (OPC) has been getting popular. Though only the OPC effect tends to be discussed at design or wafer process stages, the OPC data processing or OPC photomask writing should be also discussed. Through many experiments with fabricated OPC reticles using many kinds of OPC data, the pursuit of reasonable OPC has been continuing. Then practical design grid for reasonable OPC that will improve data processing, output volume and photomask writing time keeping with regardful OPC effect is discussed.

Citation Download Citation

Nobuhito Toyama, Hiroyuki Miyashita, and Kouji Ishida "Improvement of OPC data processing for photomask fabrication", Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); https://doi.org/10.1117/12.360196

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