Paper
25 November 1999 Calibration facility in the XUV region for reflective optics
Andrea Marco Malvezzi, Gianluca Secondi
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Abstract
A calibration facility of laboratory size and modular in design is described for absolute spectral reflectivity and spatial resolution in image-forming devices. It is based on an optical table concept where all optical elements can be modularly positioned on remotely controlled translation/rotation stages. XUV photons are provided by a minifocus conventional source with replaceable anode. K-, L-, and M- band transition radiation from different metals is used. This source can be positioned at variable distances (up to 5 m) from the measurement chamber for imaging purposes. Spectral control of the radiation used in the tests can be achieved with transmission filters, with grazing incidence reflections or with a grazing incidence monochromator. Channeltron detectors in photon counting mode monitor incident and reflected signals. This instrument is now being used for characterizing grazing incidence flat mirrors as well as multilayer-coated optical surfaces.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrea Marco Malvezzi and Gianluca Secondi "Calibration facility in the XUV region for reflective optics", Proc. SPIE 3764, Ultraviolet and X-Ray Detection, Spectroscopy, and Polarimetry III, (25 November 1999); https://doi.org/10.1117/12.371093
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Cited by 1 scholarly publication.
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KEYWORDS
Reflectivity

Mirrors

Magnesium

Extreme ultraviolet

X-ray sources

Aluminum

Electrons

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