Optical thin films grown by surface chemical reaction for high-power lasers

Shin-ichi Zaitsu; Shinji Motokoshi; Takahisa Jitsuno; Masahiro Nakatsuka; Tatsuhiko Yamanaka

doi:10.1117/12.380929

3 April 2000 Optical thin films grown by surface chemical reaction for high-power lasers

Shin-ichi Zaitsu, Shinji Motokoshi, Takahisa Jitsuno, Masahiro Nakatsuka, Tatsuhiko Yamanaka

Proceedings Volume 3889, Advanced High-Power Lasers; (2000) https://doi.org/10.1117/12.380929
Event: Advanced High-Power Lasers and Applications, 1999, Osaka, Japan

Abstract

We prepared optical thin films grown with surface chemical reactions using TiCl₄ and H₂O for TiO₂. The nonuniformity of thickness distribution was under 1% over 240 mm in diameter. The structure of TiO₂ film grown at 25 degrees Celsius was amorphous. The structure changed into polycrystalline with an increase of growth temperature up to 400 degrees Celsius. Secondary ion mass spectrometry showed that chloride residents presented in the films at every growth temperature. However, these chloride residents could be removed by thermal annealing at 400 degrees Celsius. The TiO₂ film at the growth temperature of 25 degrees Celsius had a laser-induced damage threshold of 5 J/cm² for 1-ns, 1064 nm laser pulse. The damage threshold of TiO₂ films decreased at higher growth temperature. Chloride in the films had no influence on the laser-induced damage threshold.

Citation Download Citation

Shin-ichi Zaitsu, Shinji Motokoshi, Takahisa Jitsuno, Masahiro Nakatsuka, and Tatsuhiko Yamanaka "Optical thin films grown by surface chemical reaction for high-power lasers", Proc. SPIE 3889, Advanced High-Power Lasers, (3 April 2000); https://doi.org/10.1117/12.380929

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