Microprocessing of glass materials by laser-induced plasma-assisted ablation using nanosecond pulsed lasers

Jie Zhang; Koji Sugioka; Katsumi Midorikawa

doi:10.1117/12.387571

7 June 2000 Microprocessing of glass materials by laser-induced plasma-assisted ablation using nanosecond pulsed lasers

Jie Zhang, Koji Sugioka, Katsumi Midorikawa

Proceedings Volume 3933, Laser Applications in Microelectronic and Optoelectronic Manufacturing V; (2000) https://doi.org/10.1117/12.387571
Event: Symposium on High-Power Lasers and Applications, 2000, San Jose, CA, United States

Abstract

In this paper, we demonstrate formation of micro-grating in fused silica by laser-induced plasma assisted-ablation using different wavelength lasers projected through a metallic mask. With becoming longer wavelengths from 266,532 to 1060nm, the ablation rate of fused silica at 1.5J/cm² decreases from 21,2 to nm/pulse. While the ablation threshold of laser fluence increases from 0.7, 1.5 to 3.75 J/cm². The 2.0mm deep through holes in Pyrex glass are drilled by single-beam 532nm-laser ablation. While the same deep through holes in fused quartz are only drilled by double-pulse-train of 532nm-laser ablation with a time-delay of 3.3ns. Finally, the ablation process was analyzed by an in-situ observation of laser-produced plasma, revealing different natures for surface patterning and channel- drilling.

Citation Download Citation

Jie Zhang, Koji Sugioka, and Katsumi Midorikawa "Microprocessing of glass materials by laser-induced plasma-assisted ablation using nanosecond pulsed lasers", Proc. SPIE 3933, Laser Applications in Microelectronic and Optoelectronic Manufacturing V, (7 June 2000); https://doi.org/10.1117/12.387571

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