Multispectral reflectance-mode fiber optic deposition rate monitor

James T. Daly; John A. Wollam; Fei Luo; Theodore F. Morse; Andreas Kussmaul; Dan Pulver

doi:10.1117/12.382831

17 April 2000 Multispectral reflectance-mode fiber optic deposition rate monitor

James T. Daly, John A. Wollam, Fei Luo, Theodore F. Morse, Andreas Kussmaul, Dan Pulver

Proceedings Volume 3938, Light-Emitting Diodes: Research, Manufacturing, and Applications IV; (2000) https://doi.org/10.1117/12.382831
Event: Symposium on Integrated Optoelectronics, 2000, San Jose, CA, United States

Abstract

We have developed and demonstrated a reflection-mode optical fiber-based instrument for in situ monitoring and feedback control of thin film dielectric deposition processes. The instrument operates in single-wavelength or multi-wavelength mode. One end of the fiber is placed in the deposition zone, close to the samples being coated. Single or multi-wavelength light is sent down the fiber and the reflected light from the end being coated is analyzed for intensity vs. wavelength. The fiber end being coated features an easily replaced tip to prevent loss of resolution when the coating becomes too thick. For processes in which the index of refraction or composition of the thin films is fixed, the less expensive single wavelength instrument is sufficient and measures thickness of the films by counting interference fringes. For processes in which film composition or index of refraction are variable, we use a white light source and compact spectrograph to measure reflectance vs. wavelength. For critical applications like diode laser facet coating where yield loss is significant cost driver, this monitor measures the thickness and index of refraction of single and multi-layer thin films as they are deposited. More importantly, it measures the critical parameter of interest: reflectance at the actual laser emission wavelength. This instrument replaces quartz crystal oscillators and other, more complex instruments.

Citation Download Citation

James T. Daly, John A. Wollam, Fei Luo, Theodore F. Morse, Andreas Kussmaul, and Dan Pulver "Multispectral reflectance-mode fiber optic deposition rate monitor", Proc. SPIE 3938, Light-Emitting Diodes: Research, Manufacturing, and Applications IV, (17 April 2000); https://doi.org/10.1117/12.382831

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
8 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Reflectivity

Semiconductor lasers

Reflection

Coating

Thin films

Refraction

Silicon

Show All Keywords

Keywords/Phrases

Search In:

Publication Years