Effect of acid labile ether protecting groups on the oxide etch resistance and lithographic performance of 248-nm resists

Pushkara Rao Varanasi; Kathleen M. Cornett; Margaret C. Lawson

doi:10.1117/12.388316

23 June 2000 Effect of acid labile ether protecting groups on the oxide etch resistance and lithographic performance of 248-nm resists

Pushkara Rao Varanasi, Kathleen M. Cornett, Margaret C. Lawson

Author Affiliations +

Proceedings Volume 3999, Advances in Resist Technology and Processing XVII; (2000) https://doi.org/10.1117/12.388316
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

In our attempts to develop etch resistance 248 nm positive resists, we have designed and synthesized thermally stable and acid sensitive methylbenzyl ether (MBE) protected poly(hydroxystyrene) derivatives. Results presented in this paper clearly illustrate that the MBE protecting group provides superior etch resistance to conventional carbonate, ester and acetal/ketal based protecting groups. It is also shown that the MBE protecting group is thermally stable and undergoes acid catalyzed deprotection leading to preferential rearrangement products due to electrophilic ring substitution. Such a rearrangement is shown to provide a unique mechanism to reduce/eliminate resist shrinkage and improve lithographic performance.

Citation Download Citation

Pushkara Rao Varanasi, Kathleen M. Cornett, and Margaret C. Lawson "Effect of acid labile ether protecting groups on the oxide etch resistance and lithographic performance of 248-nm resists", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388316

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