Novel resist material for sub-100-nm contact hole pattern

Jeong Hee Chung; Sang-Jun Choi; Yool Kang; Sang-Gyun Woo; Joo-Tae Moon

doi:10.1117/12.388315

23 June 2000 Novel resist material for sub-100-nm contact hole pattern

Jeong Hee Chung, Sang-Jun Choi, Yool Kang, Sang-Gyun Woo, Joo-Tae Moon

Proceedings Volume 3999, Advances in Resist Technology and Processing XVII; (2000) https://doi.org/10.1117/12.388315
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Thermal flow process using a novel resist called the SMART (SaMsung Advanced Resist for Thermal flow process) was studied. The SMART consists of the conventional polyhydroxystyrene-based polymers and the additives inducing thermal cross-linking reactions with the base polymers. With the SMART resist, 240 nm contact holes were defined by KrF lithography system. Then following one-step thermal flow resulted in down to 90 nm contact holes with vertical sidewall profile. At 90 nm resolution, the critical dimension (CD) variation on 200 mm wafer was less than 20 nm. Its etch selectivity to silicon oxide was improved due to the cross- linking reaction. The main feature of the SMART is one step process having the linear dependency of flow rate on baking temperature. The flow amount can be controlled within the range of 100 - 150 nm without any significant pattern deformation. The thermal flow process using the SMART is a promising candidate for the fabrication of gigabit devices.

Citation Download Citation

Jeong Hee Chung, Sang-Jun Choi, Yool Kang, Sang-Gyun Woo, and Joo-Tae Moon "Novel resist material for sub-100-nm contact hole pattern", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388315

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