High-Rate Sputtering For Optical Purposes

Bogdan Zega

doi:10.1117/12.935529

28 November 1983 High-Rate Sputtering For Optical Purposes

Bogdan Zega

Proceedings Volume 0401, Thin Film Technologies I; (1983) https://doi.org/10.1117/12.935529
Event: 1983 International Technical Conference/Europe, 1983, Geneva, Switzerland

Abstract

Magnetron Reactive sputtering presents interesting possibilities for the deposition of optical coatings. Many oxydes and nitrides have been obtained in this way from metallic targets, in while the synthesis of other compounds (fluorides, sulfides) is still problematic. Starting with relatively rough optical applications, as: colored window-glass coatings and indiumtin oxide layers for IR-reflectors, the high-rate magnetron sputtering becomes available for precision optical (interferential) coatings, owing to the progress made in the mastering of the reactive sputtering machinism.

Citation Download Citation

Bogdan Zega "High-Rate Sputtering For Optical Purposes", Proc. SPIE 0401, Thin Film Technologies I, (28 November 1983); https://doi.org/10.1117/12.935529

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