Fabrication of a micromachined optical modulator using the CMOS process

Hunglin Chen; Kaihsiang Yen; Huiwen Huang; Jinhung Chio; Chingliang Dai; Chienliu Chang; Peizen Chang

doi:10.1117/12.392196

11 July 2000 Fabrication of a micromachined optical modulator using the CMOS process

Hunglin Chen, Kaihsiang Yen, Huiwen Huang, Jinhung Chio, Chingliang Dai, Chienliu Chang, Peizen Chang

Proceedings Volume 4078, Optoelectronic Materials and Devices II; (2000) https://doi.org/10.1117/12.392196
Event: Photonics Taiwan, 2000, Taipei, Taiwan

Abstract

This investigation presenst a micromachined optical modulator with electrostatic actuation fabricated by the conventional CMOS process. The modulator is operated by interaction of fixed part, stationary gratings, and movable part, sliding gratings. The period of the gratings varies with the slide of the movable part, thereby allowing different diffraction patterns of the reflected light. In addition, 100% modulation in the first order can serve as an optical switch. All procedures following the CMOS process merely require a simple post-process. With maskless etching, the micromachined optical modulator is developed to obtain a high-aspect-ratio structure and high efficiency of modulation. Compare to the commercially available acoustic ones, the micromachined optical modulator proposed herein is smaller and weigh less.

Citation Download Citation

Hunglin Chen, Kaihsiang Yen, Huiwen Huang, Jinhung Chio, Chingliang Dai, Chienliu Chang, and Peizen Chang "Fabrication of a micromachined optical modulator using the CMOS process", Proc. SPIE 4078, Optoelectronic Materials and Devices II, (11 July 2000); https://doi.org/10.1117/12.392196

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