Tunneling-type giant magnetoresistance of Fe-SiO2 granular thin films prepared by rf magnetron sputtering

Yasushi Takemura; Keizo Watanabe; Keiichi Kakuno

doi:10.1117/12.408469

29 November 2000 Tunneling-type giant magnetoresistance of Fe-SiO₂ granular thin films prepared by rf magnetron sputtering

Yasushi Takemura, Keizo Watanabe, Keiichi Kakuno

Author Affiliations +

Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408469
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China

Abstract

A tunneling magnetoresistance of Fe-SiO₂ granular films was studied. The samples were prepared similarly by the preparation of multilayer films using two disks of Fe and SiO₂ sputtering targets. The superparamagnetic feature and tunneling magnetoresistance were observed for the samples with Fe composition rate of lower than 0.45. Small Fe granules isolated by SiO₂ matrix were observed by the transmission electron microscope. The magnetoresistance curves of these samples exhibited `two step' resistivity change, which was not observed from the annealed sample. This unique feature of tunneling magnetoresistance at a low magnetic field was presumably attributed to the existence of 2D structure of granules.

Citation Download Citation

Yasushi Takemura, Keizo Watanabe, and Keiichi Kakuno "Tunneling-type giant magnetoresistance of Fe-SiO₂ granular thin films prepared by rf magnetron sputtering", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); https://doi.org/10.1117/12.408469

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