Paper
8 November 2000 Extreme-ultraviolet source development: a comparison of different concepts
Guido Schriever, Manfred Rahe, Ulrich Rebhan, Dirk Basting, Wojciech J. Walecki, Hans Lauth, Rainer Lebert, Klaus Bergmann, Dieter Hoffmann, Oliver Rosier, Willi Neff, Reinhart Poprawe, Roland A. Sauerbrey, H. Schwoerer, S. Duesterer, C. Ziener, Peter Viktor Nickles, H. Stiehl, Ingo Will, Wolfgang Sandner, Guenther A. Schmahl, Dietbert M. Rudolph
Author Affiliations +
Abstract
We discuss the results of the studies of Z-pinch sources for photolithographic applications developed by Lambda Physik. We also report the results of fundamental investigations pursued by Fraunhofer-Institut fuer Lasertechnik. Friedrich- Schiller Universitat Jena, Max-Born Institut Berlin, and Gustav August Universitat Gottingen. The later efforts are supported by German government and steered by the industrial consortium led by Lambda Physik.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Guido Schriever, Manfred Rahe, Ulrich Rebhan, Dirk Basting, Wojciech J. Walecki, Hans Lauth, Rainer Lebert, Klaus Bergmann, Dieter Hoffmann, Oliver Rosier, Willi Neff, Reinhart Poprawe, Roland A. Sauerbrey, H. Schwoerer, S. Duesterer, C. Ziener, Peter Viktor Nickles, H. Stiehl, Ingo Will, Wolfgang Sandner, Guenther A. Schmahl, and Dietbert M. Rudolph "Extreme-ultraviolet source development: a comparison of different concepts", Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); https://doi.org/10.1117/12.406662
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Cited by 8 scholarly publications.
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KEYWORDS
Extreme ultraviolet

Laser applications

Plasma

Pulsed laser operation

Metrology

Laser systems engineering

Spectrographs

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