Illumination optics design for EUV lithography

Martin Antoni; Wolfgang Singer; Jorg Schultz; Johannes Wangler; Isabel Escudero-Sanz; Bob Kruizinga

doi:10.1117/12.406673

8 November 2000 Illumination optics design for EUV lithography

Martin Antoni, Wolfgang Singer, Jorg Schultz, Johannes Wangler, Isabel Escudero-Sanz, Bob Kruizinga

Proceedings Volume 4146, Soft X-Ray and EUV Imaging Systems; (2000) https://doi.org/10.1117/12.406673
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

In this paper, a comparison of two different solutions for the illuminator is presented. The systems are intended to comply with the illumination requirements, but have different advantages and drawbacks. The examples represent solutions based on conical reflection and on a fly's-eye integrator. A comparison is given and the potentials of the different solutions are outlined.

Citation Download Citation

Martin Antoni, Wolfgang Singer, Jorg Schultz, Johannes Wangler, Isabel Escudero-Sanz, and Bob Kruizinga "Illumination optics design for EUV lithography", Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); https://doi.org/10.1117/12.406673

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available