Paper
23 August 2000 Planarization process of BPSG: capillary vs. centrifugal/gravitational forces
Baw-Ching Perng, Kung Linliu
Author Affiliations +
Abstract
Film planarization process, of importance in semiconductor IC manufacturing, results from mutual competition between three forces: capillary, viscous, and gravitation. In this communication we compare, using simple geometric arguments, the order of magnitudes between the capillary force and a generalized centrifugal/gravitational force acting perpendicular to the surface. For patterns of sub-micron dimension and conditions similar to BPSG reflow and photo-resist coating we found that, within instrumental accessibility, the centrifugal term is much smaller than the capillary term. We conclude that the centrifugal/gravitational forces affect global patterns, i.e., with dimension larger than 1000 micrometers , while the capillary force dominates the sub-micro leveling process.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Baw-Ching Perng and Kung Linliu "Planarization process of BPSG: capillary vs. centrifugal/gravitational forces", Proc. SPIE 4182, Process Control and Diagnostics, (23 August 2000); https://doi.org/10.1117/12.410090
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Capillaries

Coating

Semiconducting wafers

Semiconductor manufacturing

Interfaces

Dielectrics

Etching

Back to Top