157-nm laser-induced modification of fused-silica glasses

Jie Zhang; Peter R. Herman; Christian Lauer; Kevin P. Chen; Xiaoli Midori Wei

doi:10.1117/12.432504

29 June 2001 157-nm laser-induced modification of fused-silica glasses

Jie Zhang, Peter R. Herman, Christian Lauer, Kevin P. Chen, Xiaoli Midori Wei

Proceedings Volume 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI; (2001) https://doi.org/10.1117/12.432504
Event: Photonics West 2001 - LASE, 2001, San Jose, CA, United States

Abstract

Bulk laser modification is reported for hydroxyl (OH), chlorine (Cl) and fluorine (F) containing fused-silica glasses irradiated with 157-nm F₂-laser light. We detail the effects of OH, Cl and F concentration, as well as hydrogen (H₂) loading, on compaction, refractive-index change, and color-center formation. Volume gratings formed with several tens of kJ/cm² fluence yielded surface-relief gratings of several tens of nm amplitude and bulk refractive-index changes of nearly 10^-3 in both OH- and Cl-content glasses that were pre-soaked in high-pressure hydrogen. H₂-loading offered an approximate 2-fold increase in 157-nm glass photosensitivity, and also increased the 157-nm material absorption by several factors during the exposure. In contrast, F-doped glass did not offer a measurable 157-nm photosensitivity, and the 157-nm absorption showed a surprising order-of-magnitude drop following an approximate 10-kJ/cm² laser dose.

Citation Download Citation

Jie Zhang, Peter R. Herman, Christian Lauer, Kevin P. Chen, and Xiaoli Midori Wei "157-nm laser-induced modification of fused-silica glasses", Proc. SPIE 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI, (29 June 2001); https://doi.org/10.1117/12.432504

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