High-resolution 157-nm laser micromachining of polymers

Philipp Gruenewald; Julian S. Cashmore; Jim Fieret; Malcolm C. Gower

doi:10.1117/12.432548

29 June 2001 High-resolution 157-nm laser micromachining of polymers

Philipp Gruenewald, Julian S. Cashmore, Jim Fieret, Malcolm C. Gower

Proceedings Volume 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI; (2001) https://doi.org/10.1117/12.432548
Event: Photonics West 2001 - LASE, 2001, San Jose, CA, United States

Abstract

An Exitech Microstepper exposure tool has been used to laser micromachine a variety of polymeric materials with high resolution at a wavelength of 157 nm. We have demonstrated it is possible to machine thin film materials, different photoresists and fluorine-based polymers with submicron accuracy and resolution. The tool used for this work incorporated a 36x 0.5 NA Schwarzschild lens to project submicron resolution images of binary chrome-on-CaF₂ masks onto free-standing and spun-on polymer films. The beam delivery system and the illuminator includes beam shaping and homogenization optics that allow fluences of greater than 1J/cm² to be produced at the workpiece. Details of the optical system are presented together with process parameters and the results of the materials which have been machined.

Citation Download Citation

Philipp Gruenewald, Julian S. Cashmore, Jim Fieret, and Malcolm C. Gower "High-resolution 157-nm laser micromachining of polymers", Proc. SPIE 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI, (29 June 2001); https://doi.org/10.1117/12.432548

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