Physical mechanisms of femtosecond-pulse-induced damage in dielectric thin films

Jayesh C. Jasapara; Vasudevan A. V. Nampoothiri; Wolfgang G. Rudolph; Detlev Ristau; Kai Starke

doi:10.1117/12.425032

12 April 2001 Physical mechanisms of femtosecond-pulse-induced damage in dielectric thin films

Jayesh C. Jasapara, Vasudevan A. V. Nampoothiri, Wolfgang G. Rudolph, Detlev Ristau, Kai Starke

Proceedings Volume 4347, Laser-Induced Damage in Optical Materials: 2000; (2001) https://doi.org/10.1117/12.425032
Event: Laser-Induced Damage in Optical Materials: 2000, 2000, Boulder, CO, United States

Abstract

Laser induced breakdown of a high-quality mirror consisting of alternating (lambda) /4 layers of Ta₂O₅ and SiO₂ and a single 500-nm thin film of Ta₂O₅ were studied with amplified and unamplified femtosecond pulses. The experimental data can be fitted with a model taking into account multiphoton absorption, impact ionization, and local intensity enhancements due to interference effects in the films. The results indicate that state of the art, high- quality thin films show a damage behavior that is similar to bulk materials. Defects and impurities play a negligible role. Incubation effects are found to reduce the damage threshold when the coatings are damaged with multiple pulses from a femtosecond oscillator. Time-resolved pump-probe reflection and transmission experiments indicate a decay of the excited electron plasma with characteristic time constants of 4 ps, 60 ps, and 700 ps.

Citation Download Citation

Jayesh C. Jasapara, Vasudevan A. V. Nampoothiri, Wolfgang G. Rudolph, Detlev Ristau, and Kai Starke "Physical mechanisms of femtosecond-pulse-induced damage in dielectric thin films", Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); https://doi.org/10.1117/12.425032

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