Near-infrared linear birefringence measurement system using a photoelastic modulator

Baoliang Bob Wang

doi:10.1117/12.445578

3 October 2001 Near-infrared linear birefringence measurement system using a photoelastic modulator

Baoliang Bob Wang

Proceedings Volume 4399, Optical Measurement Systems for Industrial Inspection II: Applications in Production Engineering; (2001) https://doi.org/10.1117/12.445578
Event: Lasers in Metrology and Art Conservation, 2001, Munich, Germany

Abstract

In this paper, the author reports a photoelastic modulator based linear birefringence measurement system (BMS) using a near IR laser . This instrument determines both the magnitude and angle of a birefringent sample without rotating the sample. It records birefringence images by scanning a sample that is mounted on a computer-controlled X-Y translation stage. The accuracy, repeatability and other key performance test for the NIR-BMS are provided in this report. Selected samples, including silicon optical components, a silicon wafer and waveplates commonly used at visible wavelengths, are studied using the NIR-BMS.

Citation Download Citation

Baoliang Bob Wang "Near-infrared linear birefringence measurement system using a photoelastic modulator", Proc. SPIE 4399, Optical Measurement Systems for Industrial Inspection II: Applications in Production Engineering, (3 October 2001); https://doi.org/10.1117/12.445578

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