CD measurement for next-generation mask

Takeshi Yamane; Takashi Hirano

doi:10.1117/12.438378

5 September 2001 CD measurement for next-generation mask

Takeshi Yamane, Takashi Hirano

Proceedings Volume 4409, Photomask and Next-Generation Lithography Mask Technology VIII; (2001) https://doi.org/10.1117/12.438378
Event: Photomask and Next Generation Lithography Mask Technology VIII, 2001, Kanagawa, Japan

Abstract

Since higher Critical Dimension (CD) accuracy on mask is required, there is a need to optimize CD definition for lithography. The conventional CD definition is based on the cross-sectional profile of mask pattern, but the cross-sectional profile does not reflect aerial image on wafer. Therefore, CD definition based on aerial image on wafer is preferable to the cross-sectional profile. We formulated a CD definition that reflects aerial image on wafer. In our definition, CD is called CDad. There are two types of CD measurement equipment: top view type such as CD-SEM, and transmitted light type such as deep-UV microscope. By simulation and experiment, we evaluated CD of top view and CD of deep-UV microscope to obtain CDad. The results show that CDad can be obtained with deep-UV microscope, but not to top view. Deep-UV microscope is available for CD measurement of 0.11 and 0.13 um generation masks.

Citation Download Citation

Takeshi Yamane and Takashi Hirano "CD measurement for next-generation mask", Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); https://doi.org/10.1117/12.438378

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