Paper
8 May 2001 Far-field nonlinear optical absorption in AgOx superresolution near-field structure
Fu Han Ho, Wei Yi Lin, Din Ping Tsai
Author Affiliations +
Proceedings Volume 4416, Optical Engineering for Sensing and Nanotechnology (ICOSN 2001); (2001) https://doi.org/10.1117/12.427054
Event: Optical Engineering for Sensing and Nanotechnology (ICOSN '01), 2001, Yokohama, Japan
Abstract
Nonlinear optical properties of cover glass/ZnS-SiO2(130nm)/AgOx(15nm)/ZnS- SiO2(40nm) is studied by using a focused continuous-wave (CW) He-Ne laser ((lambda) equals632.8 nm) and a pulse laser ((lambda) equals532 nm, pulse width 0.7 ns, repetition rate 15.79 kHz) with a confocal Z-scan system. The transmission confocal Z-scan shows that the sample undergoes a phase transition at different incident intensities when the light source is changed. High reflectance happens at the focusing on AgOx film. The phase transition of the sample at higher incident laser power is due to silver oxide dissociating by the laser heating process.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fu Han Ho, Wei Yi Lin, and Din Ping Tsai "Far-field nonlinear optical absorption in AgOx superresolution near-field structure", Proc. SPIE 4416, Optical Engineering for Sensing and Nanotechnology (ICOSN 2001), (8 May 2001); https://doi.org/10.1117/12.427054
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KEYWORDS
Pulsed laser operation

Reflectivity

Transmittance

Semiconductor lasers

Confocal microscopy

Continuous wave operation

Near field

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