Paper
2 October 2001 Nondestructive acoustic microimaging (AMI) analysis of MEMS materials, manufacturing, and packaging
Steven R. Martell, Janet E. Semmens, Lawrence W. Kessler
Author Affiliations +
Proceedings Volume 4558, Reliability, Testing, and Characterization of MEMS/MOEMS; (2001) https://doi.org/10.1117/12.443000
Event: Micromachining and Microfabrication, 2001, San Francisco, CA, United States
Abstract
The main type of Acoustic Micro Imaging (AMI) system utilized in this study was the C-Mode Scanning Acoustic Microscope, which is a reflection mode instrument. In this paper we describe the method and application of AMI at frequencies beyond 200 MHz, which reveals defects in the 5 micron size range at depths of 500 microns within silicon.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Steven R. Martell, Janet E. Semmens, and Lawrence W. Kessler "Nondestructive acoustic microimaging (AMI) analysis of MEMS materials, manufacturing, and packaging", Proc. SPIE 4558, Reliability, Testing, and Characterization of MEMS/MOEMS, (2 October 2001); https://doi.org/10.1117/12.443000
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CITATIONS
Cited by 6 scholarly publications.
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KEYWORDS
Semiconducting wafers

Silicon

Microelectromechanical systems

Acoustics

Wafer bonding

Packaging

Interfaces

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