A New Negative/High Resolution Photoresist WX-305

Medhat A. Toukhy; Stephen F. Marcotte Jr.

doi:10.1117/12.941781

21 May 1984 A New Negative/High Resolution Photoresist WX-305

Medhat A. Toukhy, Stephen F. Marcotte Jr.

Proceedings Volume 0469, Advances in Resist Technology I; (1984) https://doi.org/10.1117/12.941781
Event: 1984 Microlithography Conferences, 1984, Santa Clara, United States

Abstract

This resist was designed to provide images of high resolution quality and adequate sensitivity to mid/near ultraviolet radiation 310-400nm. This resist is a non-swelling aqueous developable resist with superior resolution to conventional cyclized rubber resist systems. Resolution in the 1 micron region can be obtained in contact and projection exposures with WX-305.

Citation Download Citation

Medhat A. Toukhy and Stephen F. Marcotte Jr. "A New Negative/High Resolution Photoresist WX-305", Proc. SPIE 0469, Advances in Resist Technology I, (21 May 1984); https://doi.org/10.1117/12.941781

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