Measurement of the 100-nm NIST SRM 1963 by lase surface light scattering

Thomas A. Germer; George W. Mulholland; Jung Hyeun Kim; Sheryl H. Ehrman

doi:10.1117/12.451747

11 November 2002 Measurement of the 100 nm NIST SRM 1963 by laser surface light scattering

Thomas A. Germer, George W. Mulholland, Jung Hyeun Kim, Sheryl H. Ehrman

Proceedings Volume 4779, Advanced Characterization Techniques for Optical, Semiconductor, and Data Storage Components; (2002) https://doi.org/10.1117/12.451747
Event: International Symposium on Optical Science and Technology, 2002, Seattle, WA, United States

Abstract

Accurate sizing of particles deposited on surfaces is important for the semiconductor, optical, and data storage industries. The recent availability of accurate light scattering models for non-ideal conditions enables the determination of particle size with a complete assessment of the measurement uncertainties. In this manuscript, we describe a light scattering measurement of the National Institute of Standards and Technology (NIST) Standard Reference Material (SRM) 1963 deposited onto a silicon wafer. The measurement was carried out using 441.6 nm, p-polarized light. The measurement yielded a value of 99.7 nm with an expanded uncertainty (95 % confidence limit) of 1.7 nm. The uncertainty is dominated by the reproducibility of the measurement. Uncertainties in the substrate optical properties, the thickness and optical properties of the substrate oxide, and the shape of the particle dominate the systematic uncertainty.

Citation Download Citation

Thomas A. Germer, George W. Mulholland, Jung Hyeun Kim, and Sheryl H. Ehrman "Measurement of the 100 nm NIST SRM 1963 by laser surface light scattering", Proc. SPIE 4779, Advanced Characterization Techniques for Optical, Semiconductor, and Data Storage Components, (11 November 2002); https://doi.org/10.1117/12.451747

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