Paper
19 February 2003 Fabrication of 1 μm patterns on fused silica plates by laser-induced backside wet etching (LIBWE)
Ximing Ding, Yoshizo Kawaguchi, Hiroyuki Niino, Akira Yabe
Author Affiliations +
Proceedings Volume 4830, Third International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.486571
Event: LAMP 2002: International Congress on Laser Advanced Materials Processing, 2002, Osaka, Japan
Abstract
Laser-induced backside wet etching of fused silica plates using aqueous solutions of naphthalene-1,3,6-trisulfonic acid trisodium salt (Np) and pyranine (py) was performed upon KrF excimer laser irradiation at 248 nm. The two etching media show different etching behavior with changing laser fluence and medium concentrations. Well-defined line-and-space and grid micropatterns at 1 μm scale were fabricated using an aqueous solution of Np and the etched pattern was free of debris and microcracks.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ximing Ding, Yoshizo Kawaguchi, Hiroyuki Niino, and Akira Yabe "Fabrication of 1 μm patterns on fused silica plates by laser-induced backside wet etching (LIBWE)", Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003); https://doi.org/10.1117/12.486571
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Cited by 10 scholarly publications.
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KEYWORDS
Etching

Silica

Neptunium

Excimer lasers

Absorption

Liquids

Wet etching

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