Paper
30 August 2002 Diffraction-based analysis of effects of fabricating and installation errors on a nano-alignment system
Yuhang Chen, Wenhao Huang
Author Affiliations +
Abstract
In the field of precision engineering, the demand for high resolution and accuracy in micro positioning and alignment is increasing. By superimposing a pair of specially coded 2-d gratings, the precise alignment between two gratings can be achieved. Based on diffraction theory, the effects introduced by several kinds offabricating and installation errors of the gratings are analyzed numerically in this paper. It is found that such grating alignment system has the function of reducing output error to an order of magnitude by averaging the fabricating errors. It's also found that varying the gap between the two gratings causes little effects on the output error and that the root-mean-square error of the output intensity increases linearly with the in-plane relative rotation angle between the gratings in small angle range.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuhang Chen and Wenhao Huang "Diffraction-based analysis of effects of fabricating and installation errors on a nano-alignment system", Proc. SPIE 4924, Holography, Diffractive Optics, and Applications, (30 August 2002); https://doi.org/10.1117/12.481517
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KEYWORDS
Diffraction gratings

Optical alignment

Error analysis

Diffraction

Photomasks

Moire patterns

Signal detection

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