Photoblanks for advanced lithography based on Corning high-purity fused silica (HPFS)

Robin M. Walton

doi:10.1117/12.485404

26 June 2003 Photoblanks for advanced lithography based on Corning high-purity fused silica (HPFS)

Robin M. Walton

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.485404
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Photomask specifications for advanced KrF and ArF lithography tools require improvements in both glass substrate quality and coating development. CD control and uniformity will be driven by transmission, index and birefringence uniformity of the substrate. Coating development will facilitate the use of advanced resolution enhancement techniques. Progress in the development of Corning’s HPFS blanks for advanced lithography applications is reviewed. A variety of new masking materials are being developed to complement HPFS including specialized absorber coatings with low reflectivity and phase shift coatings to enable attenuated phase-shift photomasks. The optical properties of these materials will be described.

Citation Download Citation

Robin M. Walton "Photoblanks for advanced lithography based on Corning high-purity fused silica (HPFS)", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485404

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available