DIVAS: an integrated networked system for mask defect dispositioning and defect management

Saghir Munir; Dan Bald; Vikram Tolani; Firoz Ghadiali

doi:10.1117/12.487634

2 July 2003 DIVAS: an integrated networked system for mask defect dispositioning and defect management

Saghir Munir, Dan Bald, Vikram Tolani, Firoz Ghadiali

Proceedings Volume 5043, Cost and Performance in Integrated Circuit Creation; (2003) https://doi.org/10.1117/12.487634
Event: Advanced Microelectronic Manufacturing, 2003, Santa Clara, CA, United States

Abstract

Mask quality is a prime concern to the Intel Mask Operation (IMO) and the Intel wafer fabrication customers. Extreme concern is taken to inspect and repair all defects before shipment. Given that the classification and repair of defects detected by inspection systems is labor intensive, the procedure is prone to human error. Futhermore, since operators manually disposition hundreds of defects each day, it is virtually impossible to eliminate all misclassifications. Due to diffraction effects, not all defects resolve on a wafer. Hence, a defect that an operator may classify as 'real' may indeed be 'lithographically insignifincant'. Conversely an operator may miss a defect that prints, causing a serious reduction in product yield. The DIVAS (Defect, Inspection, Viewing, Archiving and Simulation) system has been described previously and was developed to address these manual classification issues. This paper outlines the fully automated system deployed in a production environment.

Citation Download Citation

Saghir Munir, Dan Bald, Vikram Tolani, and Firoz Ghadiali "DIVAS: an integrated networked system for mask defect dispositioning and defect management", Proc. SPIE 5043, Cost and Performance in Integrated Circuit Creation, (2 July 2003); https://doi.org/10.1117/12.487634

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