Using notch filter masks for high-contrast imaging of extra solar planets

John H. Debes; Jian Ge; Marc Kuchner; Michael Rogosky

doi:10.1117/12.505922

19 November 2003 Using notch filter masks for high-contrast imaging of extra solar planets

John H. Debes, Jian Ge, Marc Kuchner, Michael Rogosky

Proceedings Volume 5170, Techniques and Instrumentation for Detection of Exoplanets; (2003) https://doi.org/10.1117/12.505922
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

We present the first lab experiments using a notch filter mask, a coronagraphic mask that dims the light from an on-axis source while passing off-axis light unscathed. The notch filter mask is essentially an optimized Lyot coronagraph that diffracts all of the light from the central object into a small ring that can be blocked by a Lyot stop. Notch filter masks provide a high throughput, very high contrast alternative to traditional Lyot coronagraphs. These masks, like all methods for achieving high contrast, require a high amount of accuracy in design to be successful. Nanofabrication techniques can meet these design challenges; with the first notch filter mask prototype fabricated with .25 μm precision using an e-beam lithography machine. When placed in a test bed, initial results show that 10^-5 contrast is achieved at 3λ/Δ and 10^-6 at ~8λ/Δ with a throughput of 27%. The coronagraph rejects light from the point source's peak by at least 4 orders of magnitude despite leakage of light through the mask. We speculate on the "as-is" performance of such a mask in the Hubble Space Telescope.

Citation Download Citation

John H. Debes, Jian Ge, Marc Kuchner, and Michael Rogosky "Using notch filter masks for high-contrast imaging of extra solar planets", Proc. SPIE 5170, Techniques and Instrumentation for Detection of Exoplanets, (19 November 2003); https://doi.org/10.1117/12.505922

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