Fabrication and metrology of 10X Schwarzschild optics for EUV imaging

Louis A. Marchetti

doi:10.1117/12.510318

13 January 2004 Fabrication and metrology of 10X Schwarschild optics for EUV imaging

Louis A. Marchetti

Proceedings Volume 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications; (2004) https://doi.org/10.1117/12.510318
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

ASML Optics recently completed two sets of 10X Schwarschild optics for use in an EUV imaging application. The 10X system consists of two spherical elements - a primary, convex element fabricated from fused silica and a secondary, concave element fabricated from Zerodur. This paper outlines the fabrication process, and discusses the challenges to optical metrology due to the particular form factor and the exacting tolerances placed on the optics. These challenges were met using a variety of metrology tools including full-aperture metrology, phase measuring microscopy (PMM), atomic force microscopy (AFM), and a new mid-frequency interferometer (SASHIMI). A comparison of the recently completed optics is made to the set of 10X optics previously fabricated and delivered in early 1999.

Citation Download Citation

Louis A. Marchetti "Fabrication and metrology of 10X Schwarschild optics for EUV imaging", Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, (13 January 2004); https://doi.org/10.1117/12.510318

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