Paper
23 December 2003 Double multilayer monochromator to tailor bending magnet radiation spectrum
Thierry Bigault, Eric Ziegler, Christian Morawe, Robert Hustache, Jean-Yves Massonnat, Gerard Rostaing
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Abstract
A double-reflection multilayer monochromator is being developed at BM5 in order to fulfill two different functions. As a primary monochromator, it provides higher bandpass and higher photon flux than the Si(111) Bragg crystal monochromator. In combination with the crystal monochromator, it rejects the harmonics and the beam exit can be kept fixed. An additional aim is to preserve the beam coherence. Design issues and performances evaluated on the beamline are presented.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Thierry Bigault, Eric Ziegler, Christian Morawe, Robert Hustache, Jean-Yves Massonnat, and Gerard Rostaing "Double multilayer monochromator to tailor bending magnet radiation spectrum", Proc. SPIE 5195, Crystals, Multilayers, and Other Synchrotron Optics, (23 December 2003); https://doi.org/10.1117/12.515980
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Cited by 5 scholarly publications.
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KEYWORDS
Monochromators

Crystals

Laser crystals

Reflectivity

Absorption

Sensors

Silicon

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