Ion-assisted deposition processes: industrial network IntIon

Henrik Ehlers; Karl-Josef Becker; Rudolf Beckmann; Nils Beermann; Ulf Brauneck; Peter Fuhrberg; Dieter Gaebler; Stefan Jakobs; Norbert Kaiser; Michael Kennedy; Friedrich Koenig; Sven Laux; Juergen Christian Mueller; Bernd Rau; Werner Riggers; Detlev Ristau; Dieter Schaefer; Olaf Stenzel

doi:10.1117/12.514817

25 February 2004 Ion-assisted deposition processes: industrial network IntIon

Henrik Ehlers, Karl-Josef Becker, Rudolf Beckmann, Nils Beermann, Ulf Brauneck, Peter Fuhrberg, Dieter Gaebler, Stefan Jakobs, Norbert Kaiser, Michael Kennedy, Friedrich Koenig, Sven Laux, Juergen Christian Mueller, Bernd Rau, Werner Riggers, Detlev Ristau, Dieter Schaefer, Olaf Stenzel

Author Affiliations +

Proceedings Volume 5250, Advances in Optical Thin Films; (2004) https://doi.org/10.1117/12.514817
Event: Optical Systems Design, 2003, St. Etienne, France

Abstract

The presented work is embedded in the research network “Integrative Ion Processes for Modern Optics”, called IntIon, consisting of 12 partners from the German optics industry and two research institutes. The main target of the IntIon network is the development of new process concepts on the basis of ion assisted deposition (IAD) for the industrial production of optical thin film components. Besides an improvement in efficiency, a major aim is concentrated on the optical characteristics for selected application fields with high economical potential. In this network, different ion and plasma sources are compared with regard to their qualification for ion assisted deposition processes. This work includes the characterization of the ion energy and ion current using Faraday-cup measurements. The selection of investigated coating materials includes a broad variety of standard and non-standard oxides. First results of the network will be presented for adapted deposition materials and different operation characteristics of ion sources.

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Henrik Ehlers, Karl-Josef Becker, Rudolf Beckmann, Nils Beermann, Ulf Brauneck, Peter Fuhrberg, Dieter Gaebler, Stefan Jakobs, Norbert Kaiser, Michael Kennedy, Friedrich Koenig, Sven Laux, Juergen Christian Mueller, Bernd Rau, Werner Riggers, Detlev Ristau, Dieter Schaefer, and Olaf Stenzel "Ion-assisted deposition processes: industrial network IntIon", Proc. SPIE 5250, Advances in Optical Thin Films, (25 February 2004); https://doi.org/10.1117/12.514817

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