CD uniformity dependence on CAR PEB process and its improvement for EUVL mask fabrication

Bing Lu; James R. Wasson; Eric Weisbrod; Pawitter Mangat; Eric Ainley; Adolpho Rios; Kevin J. Nordquist

doi:10.1117/12.517989

17 December 2003 CD uniformity dependence on CAR PEB process and its improvement for EUVL mask fabrication

Bing Lu, James R. Wasson, Eric Weisbrod, Pawitter Mangat, Eric Ainley, Adolpho Rios, Kevin J. Nordquist

Proceedings Volume 5256, 23rd Annual BACUS Symposium on Photomask Technology; (2003) https://doi.org/10.1117/12.517989
Event: Photomask Technology, 2003, Monterey, California, United States

Abstract

In this work, we analyzed resist CD uniformity on 6025 substrates in terms of resist PEB sensitivity, PEB time, temperature variation during ramp up, hotplate vacuum and the application of a chill plate. We found that the resist PEB sensitivity, PEB time and the final temperature were the most important factors. By selecting low PEB sensitive resist and optimizing the bake conditions, the CD uniformity was greatly improved. The temperature profile of the hotplate configuration used for this study will be discussed along with the CD uniformity obtained using this hotplate under various conditions.

Citation Download Citation

Bing Lu, James R. Wasson, Eric Weisbrod, Pawitter Mangat, Eric Ainley, Adolpho Rios, and Kevin J. Nordquist "CD uniformity dependence on CAR PEB process and its improvement for EUVL mask fabrication", Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); https://doi.org/10.1117/12.517989

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