Laser cooling for Si atom manipulation with atomic mirror

Hiroshi Kumagai; S. Shimizu; T. Iwane; A. Kunieda; Katsumi Midorikawa; Minoru Obara

doi:10.1117/12.532842

15 July 2004 Laser cooling for Si atom manipulation with atomic mirror

Hiroshi Kumagai, S. Shimizu, T. Iwane, A. Kunieda, Katsumi Midorikawa, Minoru Obara

Proceedings Volume 5339, Photon Processing in Microelectronics and Photonics III; (2004) https://doi.org/10.1117/12.532842
Event: Lasers and Applications in Science and Engineering, 2004, San Jose, Ca, United States

Abstract

Highly efficient frequency conversions were conducted to obtain a deep-ultraviolet single-mode coherent light using two-stage external cavities. 154-mW power at around 252 nm was obtained with a conversion efficiency of more than 8% by doubly resonant sum-frequency mixing of 373-nm light from the first-stage conversion and 780-nm light from a single-mode Ti:sapphire laser. The output performances of the deep-ultraviolet light source are sufficient for realizing the laser cooling of neutral silicon atoms and then their manipulation with an atomic mirror.

Citation Download Citation

Hiroshi Kumagai, S. Shimizu, T. Iwane, A. Kunieda, Katsumi Midorikawa, and Minoru Obara "Laser cooling for Si atom manipulation with atomic mirror", Proc. SPIE 5339, Photon Processing in Microelectronics and Photonics III, (15 July 2004); https://doi.org/10.1117/12.532842

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