Paper
30 December 2003 Three-dimensional microfabrication using two-photon absorption by femtosecond laser
Shin Wook Yi, Seong Ku Lee, Hong Jin Kong, Dong-Yol Yang, Sang-hu Park, Tae-woo Lim, Ran Hee Kim, Kwang-Sup Lee
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Abstract
As a femtosecond laser has recently been developed, both of high power and high photon density are easily obtained. The high photon density results in photopolymerization of urethane acrylate resin whose absorption spectrum is shorter than that of the femtosecond laser. The stereo-lithography using the two-photon absorption (TPA) makes micro structures with great resolution. We used this phenomenon to make micron-sized structures with sub-micron resolution. Before fabricating 3-D structures, precise 2-D structures were preceded. The TPA photopolymerization was applied of poly-dimethyl siloxane (PDMS) molding. In this paper, we report the recent progress and application of this technology in our laboratory.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shin Wook Yi, Seong Ku Lee, Hong Jin Kong, Dong-Yol Yang, Sang-hu Park, Tae-woo Lim, Ran Hee Kim, and Kwang-Sup Lee "Three-dimensional microfabrication using two-photon absorption by femtosecond laser", Proc. SPIE 5342, Micromachining and Microfabrication Process Technology IX, (30 December 2003); https://doi.org/10.1117/12.524310
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CITATIONS
Cited by 10 scholarly publications.
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KEYWORDS
Absorption

Femtosecond phenomena

Lithography

Microfabrication

Raster graphics

Scanning electron microscopy

3D optical data storage

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