Planar distortion quantification to evaluate PDMS stamps affixed on glass support

Quanguo He; Zhengchun Liu; Jianxin Tang; Libo Nie; Hong Xiang; Hong Chen; Pengfeng Xiao; Nongyue He

doi:10.1117/12.523899

23 December 2003 Planar distortion quantification to evaluate PDMS stamps affixed on glass support

Quanguo He, Zhengchun Liu, Jianxin Tang , Libo Nie, Hong Xiang, Hong Chen, Pengfeng Xiao, Nongyue He

Proceedings Volume 5343, Reliability, Testing, and Characterization of MEMS/MOEMS III; (2003) https://doi.org/10.1117/12.523899
Event: Micromachining and Microfabrication, 2004, San Jose, California, United States

Abstract

This article describes a planar distortion quantification method for PDMS stamps used in soft lithography by introducing an angular parameter θ; the distortion θ is proportional to planar distortion in magnitude. We employ this method to evaluate PDMS stamps planar distortions supported on different treated glass with Micron XYZ Scope measurements. The average planar distortion of individual pattern (absolute distortion θ₁) and their pattern-to-pattern distortion (relative distortion θ₂) of PDMS stamps were determined by angular discrepancies (θ). The planar distortion quantification was evaluated among four different PDMS stamps affixation treatments, and the PDMS stamps supported on silane-modified glass showed strong binding and minimal planar distortion, its absolute angular distortion θ₁ was 3.98x10^-3and relative angular distortion θ₂ 1.22x10^-3. Such distortion quantification agreed with the results of linear and area shrinkages on the stamps surface patterns, the results showed high reliability and fidelity of PDMS stamps and similar elastomer micro-patterns supported on silane-modified glass by photo lithographic microfabrication method and their promising prospects for on-chip synthesis of DNA microarray and bio-devices fabrication in soft lithography. The distortion evaluations demonstrate a versatile method for quantifying and comparing planar distortions among patterns as well as screening elastomer stamps support in soft lithography.

Citation Download Citation

Quanguo He, Zhengchun Liu, Jianxin Tang , Libo Nie, Hong Xiang, Hong Chen, Pengfeng Xiao, and Nongyue He "Planar distortion quantification to evaluate PDMS stamps affixed on glass support", Proc. SPIE 5343, Reliability, Testing, and Characterization of MEMS/MOEMS III, (23 December 2003); https://doi.org/10.1117/12.523899

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KEYWORDS

Distortion

Glasses

Lithography

Information operations

Optical lithography

Reliability

Moire patterns

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