Cost of ownership reduction for OPC development and production

Chi-Min Yuan; Bob Jarvis; Kevin D. Lucas; Robert Boone; Ruiqi Tian; Alfred Reich

doi:10.1117/12.535279

28 May 2004 Cost of ownership reduction for OPC development and production

Chi-Min Yuan, Bob Jarvis, Kevin D. Lucas, Robert Boone, Ruiqi Tian, Alfred Reich

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.535279
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

The cost of developing and deploying optical proximity correction (OPC) technology has become a non-negligible part of the total lithography cost of ownership (CoO). In this paper, we present our efforts to reduce costs associated with OPC in the development phase for the 90nm node, and production phase for the 130nm node.

Citation Download Citation

Chi-Min Yuan, Bob Jarvis, Kevin D. Lucas, Robert Boone, Ruiqi Tian, and Alfred Reich "Cost of ownership reduction for OPC development and production", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.535279

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