The masks fabricated by UV LIGA for excimer laser ablation and x-ray lithography

Jingqiu Liang; Zichun Le; Weibiao Wang; Liangqiang Peng; Weihua Lan; Anjie Ming; Jian Ye; Bisheng Quan; Jinsong Yao; Ming Xuan; Lijun Wang

doi:10.1117/12.557781

20 August 2004 The masks fabricated by UV LIGA for excimer laser ablation and x-ray lithography

Jingqiu Liang, Zichun Le, Weibiao Wang, Liangqiang Peng, Weihua Lan, Anjie Ming, Jian Ye, Bisheng Quan, Jinsong Yao, Ming Xuan, Lijun Wang

Author Affiliations +

Proceedings Volume 5446, Photomask and Next-Generation Lithography Mask Technology XI; (2004) https://doi.org/10.1117/12.557781
Event: Photomask and Next Generation Lithography Mask Technology XI, 2004, Yokohama, Japan

Abstract

In the present paper, a mask structure called adhering mask for excimer laser ablation is introduced. This mask is fabricated directly on the etched material, so it needn't a supporting chip and it thus has high transmission. Its absorber is made of gold and is fabricated by UV LIGA technology. Therefore the mask has more accurate structure and more smooth edges. This mask can fulfill the direct etching of the polymers by using a simpler optical system and can be a method of the mass production to some extent. The other mask is developed for X-ray lithography. It is made by UV LIGA process too. It consists of the substrate, the absorber and the supporter. The substrate is made of PI and the absorber is prepared by gold. The structure, fabrication process and experiment results of this mask are given.

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Jingqiu Liang, Zichun Le, Weibiao Wang, Liangqiang Peng, Weihua Lan, Anjie Ming, Jian Ye, Bisheng Quan, Jinsong Yao, Ming Xuan, and Lijun Wang "The masks fabricated by UV LIGA for excimer laser ablation and x-ray lithography", Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); https://doi.org/10.1117/12.557781

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KEYWORDS

Photomasks

Excimer lasers

Laser ablation

X-rays

X-ray lithography

Photoresist materials

Ultraviolet radiation

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