Paper
17 August 2004 Scanning diffraction microscopy: far-field microscopy by interferometry and diffraction combination
Author Affiliations +
Abstract
We have realized a novel optical microscope that uses the coherent superposition of diffused and diffracted beams. A laser emitting at 670nm is illuminating at oblique incidence the sample surface while a sharp metallic tip is partially obstructing the beam. The coherent superposition of diffracted radiation, coming from the tip sample region, and the reference beam, diffused by the whole surface, is collected in the far field during XY scan, obtained moving the sample only. The aperture between the tip, kept fixed at a working distance of the order of 20μm, and the local surface topography realizes a variable diffracting aperture, producing an intensity variations at the detector plane. We show clear images of a test structure with a resolution better than λ/10. A simple model is used and it is shown to be able to explain the obtained results.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stefano Selci "Scanning diffraction microscopy: far-field microscopy by interferometry and diffraction combination", Proc. SPIE 5458, Optical Micro- and Nanometrology in Manufacturing Technology, (17 August 2004); https://doi.org/10.1117/12.545582
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KEYWORDS
Diffraction

Microscopy

Interferometry

Sensors

Superposition

Copper

Image resolution

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