Slitmasks from observer to telescope: astrometric slitmask manufacturing and control for Keck spectrographs

De A. Clarke; Steven L. Allen; Gregory D. Wirth; Andrew C. Phillips

doi:10.1117/12.552300

15 September 2004 Slitmasks from observer to telescope: astrometric slitmask manufacturing and control for Keck spectrographs

De A. Clarke, Steven L. Allen, Gregory D. Wirth, Andrew C. Phillips

Author Affiliations +

Proceedings Volume 5496, Advanced Software, Control, and Communication Systems for Astronomy; (2004) https://doi.org/10.1117/12.552300
Event: SPIE Astronomical Telescopes + Instrumentation, 2004, Glasgow, United Kingdom

Abstract

This paper documents the astrometric slitmask design, submission, fabrication, control and configuration tools used for two large spectrographs at W. M. Keck Observatory on Mauna Kea, Hawai'i. For supplemental illustrations and documents, including an online version of the poster and interactive demos, we refer the reader to http://spg.ucolick.org/Docs/SPIE/2004 .

Citation Download Citation

De A. Clarke, Steven L. Allen, Gregory D. Wirth, and Andrew C. Phillips "Slitmasks from observer to telescope: astrometric slitmask manufacturing and control for Keck spectrographs", Proc. SPIE 5496, Advanced Software, Control, and Communication Systems for Astronomy, (15 September 2004); https://doi.org/10.1117/12.552300

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