Hard Surface Masks

James Jacobson

doi:10.1117/12.954251

1 March 1974 Hard Surface Masks

James Jacobson

Proceedings Volume 0055, Technological Advances in Micro and Submicro Photofabrication Imagery; (1974) https://doi.org/10.1117/12.954251
Event: Acquisition and Analysis of Pictorial Data, 1974, San Diego, United States

Abstract

The need for high quality masks, extended mask life, and, to a greater extent, lesser defects in masking wafers, has led the MOS Department at Signetics to evolve from the use of emulsion-soda-lime masks, used in contact printing, to iron-oxide-alumina-soda-lime masks, used in proximity printing. In the beginning, emulsion photo plates held the most widespread recognition within the IC industry, and are considered by many as somewhat of a standard. Noteworthy reasons for their widespread acceptance are that emulsion masks are readily available, easily processed, inexpensive, and produce good quality images. However, their greatest drawback is quality as a working plate and its subsequent degradation, beginning with its first contact with the wafer. Also the quality of emulsion masks is less than desirable in critical dimension control, glass quality, and mask layer registration; and when these plates are used in contact printing, their life hovers around six to eight exposures per mask.

Citation Download Citation

James Jacobson "Hard Surface Masks", Proc. SPIE 0055, Technological Advances in Micro and Submicro Photofabrication Imagery, (1 March 1974); https://doi.org/10.1117/12.954251

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