Surface profile measurement using chromatic confocal microscopy

Kebin Shi; Peng Li; Shizhuo Yin; Zhiwen Liu

doi:10.1117/12.571595

16 December 2004 Surface profile measurement using chromatic confocal microscopy

Kebin Shi, Peng Li, Shizhuo Yin, Zhiwen Liu

Proceedings Volume 5606, Two- and Three-Dimensional Vision Systems for Inspection, Control, and Metrology II; (2004) https://doi.org/10.1117/12.571595
Event: Optics East, 2004, Philadelphia, Pennsylvania, United States

Abstract

We investigate lateral and axial chromatic confocal microscopy using supercontinuum white light, and its application to surface profile measurement. In the systems that we describe here, the lateral or the axial scanning is effectively realized by focusing different wavelengths of the supercontinuum to either different lateral or axial positions through purposely introduced chromatic dispersion and aberration respectively. As a result, the imaging speed can be greatly improved. We use this system to demonstrate the surface profile measurement of a microcircuit chip, with a sensitivity of 8.5 nm and a depth measurement range of about 7 microns.

Citation Download Citation

Kebin Shi, Peng Li, Shizhuo Yin, and Zhiwen Liu "Surface profile measurement using chromatic confocal microscopy", Proc. SPIE 5606, Two- and Three-Dimensional Vision Systems for Inspection, Control, and Metrology II, (16 December 2004); https://doi.org/10.1117/12.571595

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