Interferometric pattern defects recognized by using wavelet transform with DSP

Chuen-Lin Tien; Min-Chieh Lu; Wen-Fung Liu; Shung-Zeng Peng

doi:10.1117/12.576459

10 February 2005 Interferometric pattern defects recognized by using wavelet transform with DSP

Chuen-Lin Tien, Min-Chieh Lu, Wen-Fung Liu, Shung-Zeng Peng

Proceedings Volume 5638, Optical Design and Testing II; (2005) https://doi.org/10.1117/12.576459
Event: Photonics Asia, 2004, Beijing, China

Abstract

This paper presents a DSP-base defect recognition system by using wavelet transform and the gray level co-occurrence matrix (GLCM). It can be used to detect the texture image of wafer surface which is captured from a laser interferometer. Wavelet analysis associated with the entropy criterion appears to be a good method for recognizing automatically the defects of the interferometric patterns. Three-dimensional plots of the GLCM for various captured images have been compared and discussed. The parameter of entropy has been calculated from the GLCM and can be used as an indicator for surface flatness.

Citation Download Citation

Chuen-Lin Tien, Min-Chieh Lu, Wen-Fung Liu, and Shung-Zeng Peng "Interferometric pattern defects recognized by using wavelet transform with DSP", Proc. SPIE 5638, Optical Design and Testing II, (10 February 2005); https://doi.org/10.1117/12.576459

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