Imaging simulation of maskless lithography using a DMD

Chi Liu; Xiaowei Guo; Fuhua Gao; Boliang Luo; Xi Duan; Jinglei Du; Chuankai Qiu

doi:10.1117/12.577352

27 January 2005 Imaging simulation of maskless lithography using a DMD

Chi Liu, Xiaowei Guo, Fuhua Gao, Boliang Luo, Xi Duan, Jinglei Du, Chuankai Qiu

Proceedings Volume 5645, Advanced Microlithography Technologies; (2005) https://doi.org/10.1117/12.577352
Event: Photonics Asia, 2004, Beijing, China

Abstract

A maskless lithography imaging simulation using digital micromirror device (DMD) was investigated. The DMD acts as a reflective spatial light modulator. The micro-mirrors on DMD can be instructed by the computer to tilt them ±12° off their normal position which produces a mask pattern, and then the mask pattern can be carried onto the surface of wafer by the imaging system. Because the imaging of the maskless lithography is a complex process, it is necessary to simulate and analyze its practical process. In this paper, we present a partial coherent imaging model of maskless lithography considering the practical projection characterization of DMD. With the model, it is convenient to simulate the lithography of arbitrarily shaped microstructure using DMD. Through calculation, the spatial image in maskless lithography process based on gray scale photolithography with DMD real-time masks was obtained.

Citation Download Citation

Chi Liu, Xiaowei Guo, Fuhua Gao, Boliang Luo, Xi Duan, Jinglei Du, and Chuankai Qiu "Imaging simulation of maskless lithography using a DMD", Proc. SPIE 5645, Advanced Microlithography Technologies, (27 January 2005); https://doi.org/10.1117/12.577352

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