Arrayed microcolumns for high throughput lithography

Ho Seob Kim; Dae-Wook Kim; Seung Joon Ahn; Young Chul Kim; Yong Jang; Hyeng Woo Kim; Sang Kook Choi; Dae Yong Kim

doi:10.1117/12.599575

6 May 2005 Arrayed microcolumns for high throughput lithography

Ho Seob Kim, Dae-Wook Kim, Seung Joon Ahn, Young Chul Kim, Yong Jang, Hyeng Woo Kim, Sang Kook Choi, Dae Yong Kim

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.599575
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

The small size of the microcolumn opens the possibility for arrayed operation on a scale commensurate. An arrayed microcolumn test-bed system has been developed for high throughput applications. The arrayed microcolumns based on of Single Column Module (SCM), and Wafer-Scale Column Module (WCM) concepts have been fabricated and successfully demonstrated. Low energy microcolumn lithography has been operated in the energy range from 100 eV to 1 keV for the generation of nano patterns. Probe beam current at the sample was measured about 2 nA at a total beam current of ~0.4 mA. The magnitude of probe beam current is strong enough for the low energy lithography. The thin layers of PMMA resist have been employed. The results of nano-patterning by low energy microcolumn lithography will be discussed.

Citation Download Citation

Ho Seob Kim, Dae-Wook Kim, Seung Joon Ahn, Young Chul Kim, Yong Jang, Hyeng Woo Kim, Sang Kook Choi, and Dae Yong Kim "Arrayed microcolumns for high throughput lithography", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.599575

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