Plasma pinch EUV source with particle injection

Malcolm W. McGeoch

doi:10.1117/12.599980

6 May 2005 Plasma pinch EUV source with particle injection

Malcolm W. McGeoch

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.599980
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Pinch discharge EUV sources tend to produce 13.5nm radiation from an elongated plasma, decreasing the possible collection efficiency for the lowest etendue collector designs. As a means to concentrate EUV emission we have investigated particle injection to locate the radiating species in a small volume at the center of the pinch. We have considered theoretically the rate of ionization and expansion of a small tin droplet in a buffer gas pinch plasma of argon or helium. The particle becomes negatively charged, with consequences for the electron and ion heat fluxes onto its surface. Photo-emission can reduce this negative potential and enhance the electron heat flux. We estimate that the 30 μm diameter tin particle that contains the minimum, or 'mass limited' number of atoms for a 5J EUV-emitting plasma, will fully ionize in less than 100nsec in a typical Star Pinch [1] plasma at the relevant electron density of 2x10¹⁹ cm^-3 and temperature of 30eV. We report on the generation of high velocity, on-demand, accurately positioned tin droplets suitable for the injection pinch, and on limitations to the system reliability.

Citation Download Citation

Malcolm W. McGeoch "Plasma pinch EUV source with particle injection", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.599980

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