A simulation performance framework using in situ metrology

Joseph J. Bendik; Yuji Yamaguchi; Lyle G. Finkner; Adlai H. Smith

doi:10.1117/12.600135

12 May 2005 A simulation performance framework using in situ metrology

Joseph J. Bendik, Yuji Yamaguchi, Lyle G. Finkner, Adlai H. Smith

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.600135
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Modern lithographic simulation engines¹ are quite capable of determining the detrimental impact of source and lens aberrations on low k1 lithographic metrics - given the proper input². Circuit designers, lithographic engineers, and manufacturing facilities would seem to be the beneficiaries of the predictive power of lithographic simulators; however, in-situ methods for accurately determining lens aberrations and source metrology maps have only rather recently been accepted³ and integrated into practice⁴. For this work, we introduce several new methods for characterizing scanner performance including a high accuracy source metrology tool and integrated simulation engine⁵. We focus attention on the combined detrimental effects of lens aberrations, source non-ideality, distortion, synchronization error, and transmission error on deep sub-wavelength lithographic metrics such as: H-V bias, feature-shift, and ΔCD. After a brief theoretical discussion, we describe a matrix of simulation case studies and present results. Finally, we discuss potential applications for the simulation performance framework and its potential impact to industry.

Citation Download Citation

Joseph J. Bendik, Yuji Yamaguchi, Lyle G. Finkner, and Adlai H. Smith "A simulation performance framework using in situ metrology", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.600135

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