Reflectivity function based illumination and sensor planning for industrial inspection

Marc M. Ellenrieder; Christian Wohler; Pablo d'Angelo

doi:10.1117/12.612547

13 June 2005 Reflectivity function based illumination and sensor planning for industrial inspection

Marc M. Ellenrieder, Christian Wohler, Pablo d'Angelo

Proceedings Volume 5856, Optical Measurement Systems for Industrial Inspection IV; (2005) https://doi.org/10.1117/12.612547
Event: Optical Metrology, 2005, Munich, Germany

Abstract

In this paper, we will derive a phenomenological model of the bidirectional reflectance distribution function of non-Lambertian metallic materials typically used in industrial inspection. We will show, how the model can be fitted to measured reflectance values and how the fitted model can be used to determine a suitable illumination position. Together with a given sensor pose, this illumination position can be used to calculate the necessary shutter time, aperture, focus setting and expected gray value to successfully perform a given visual inspection task. The paper concludes with several example inspection tasks.

Citation Download Citation

Marc M. Ellenrieder, Christian Wohler, and Pablo d'Angelo "Reflectivity function based illumination and sensor planning for industrial inspection", Proc. SPIE 5856, Optical Measurement Systems for Industrial Inspection IV, (13 June 2005); https://doi.org/10.1117/12.612547

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