Characterization of extreme ultraviolet (EUV) emission from xenon generated using a compact plasma-discharge source for lithography applications

H. Merabet; R. Bista; C. Schubert; S. Fuelling; R. Bruch; A. L. Godunov

doi:10.1117/12.613983

31 August 2005 Characterization of extreme ultraviolet (EUV) emission from xenon generated using a compact plasma-discharge source for lithography applications

H. Merabet, R. Bista, C. Schubert, S. Fuelling, R. Bruch, A. L. Godunov

Author Affiliations +

Proceedings Volume 5918, Laser-Generated, Synchrotron, and Other Laboratory X-Ray and EUV Sources, Optics, and Applications II; 59180E (2005) https://doi.org/10.1117/12.613983
Event: Optics and Photonics 2005, 2005, San Diego, California, United States

Abstract

In this work we have studied the generation of Extreme Ultraviolet (EUV) light by a novel Compact Electron Cyclotron Resonance Ion Source (CECRIS). The EUV emission diagnostics of the ECR plasma was accomplished by means of a 1.5 m Grazing Incidence Monochromator which was operated in a wavelength range of 4-90 nm under the condition of medium to high resolution to discriminate between spectra arising from different Xe^q+ (q = 1-10) charge states. One of the major accomplishments of this study is assignment of numerous new optical transitions for Xenon in the 10-80 nm range under absolute conditions to create a database for further investigations. High resolution spectra were recorded confirming fair contributions from highly excited Xe¹⁰⁺ and Xe⁹⁺ ionic states. Major outcome of this work is that the Xe¹⁰⁺ ion emission with λ = 13.4 nm may occurs with such a simplified and compact ECR source. The EUV emission of this particular line is of great interest for lithography applications.

Citation Download Citation

H. Merabet, R. Bista, C. Schubert, S. Fuelling, R. Bruch, and A. L. Godunov "Characterization of extreme ultraviolet (EUV) emission from xenon generated using a compact plasma-discharge source for lithography applications", Proc. SPIE 5918, Laser-Generated, Synchrotron, and Other Laboratory X-Ray and EUV Sources, Optics, and Applications II, 59180E (31 August 2005); https://doi.org/10.1117/12.613983

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