Study of ruthenium-capped multilayer mirror for EUV irradiation durability

Hiromitsu Takase; Shigeru Terashima; Yoshio Gomei; Masayuki Tanabe; Yutaka Watanabe; Takashi Aoki; Katsuhiko Murakami; Shuichi Matsunari; Masahito Niibe; Yukinobu Kakutani

doi:10.1117/12.657089

24 March 2006 Study of ruthenium-capped multilayer mirror for EUV irradiation durability

Hiromitsu Takase, Shigeru Terashima, Yoshio Gomei, Masayuki Tanabe, Yutaka Watanabe, Takashi Aoki, Katsuhiko Murakami, Shuichi Matsunari, Masahito Niibe, Yukinobu Kakutani

Author Affiliations +

Proceedings Volume 6151, Emerging Lithographic Technologies X; 615135 (2006) https://doi.org/10.1117/12.657089
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

The changes of chemical state and multilayer structure of Ru capped multilayer mirrors (MLMs) by irradiation of extreme ultraviolet (EUV) from synchrotron radiation (SR) were investigated using Auger electron spectroscopy (AES). It was found that irradiation induced Si diffusion and Si oxidation. Calculation of temperature distribution showed that Si diffusion was less relevant to temperature during irradiation.

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Hiromitsu Takase, Shigeru Terashima, Yoshio Gomei, Masayuki Tanabe, Yutaka Watanabe, Takashi Aoki, Katsuhiko Murakami, Shuichi Matsunari, Masahito Niibe, and Yukinobu Kakutani "Study of ruthenium-capped multilayer mirror for EUV irradiation durability", Proc. SPIE 6151, Emerging Lithographic Technologies X, 615135 (24 March 2006); https://doi.org/10.1117/12.657089

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